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Silicon sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.999% (metals basis)
Descrizione
Silicon sputtering target in ultra high purity silicon is used in the semiconductor industry as a result of its semiconducting properties. It is used as an alloying element in the manufacture of certain alloys (e.g. ferrosilicon, an alloy of iron and silicon which is used to introduce silicon into steel and cast iron). It is also used in the manufacture of glass and computer microchips.
This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.
Specifica
Specifica
| Materiale o nome chimico | Silicon sputtering target |
| Nota nome | 50.8mm (2.0 in.) dia. x 6.35mm (0.250 in.) thick |
| Quantità | 1 Ea. |
| CAS | 7440-21-3 |
| Odore | Odorless |
| Note percentuale saggio | (metals basis) |
| Formula molecolare | Si |
| Numero MDL | MFCD00085311 |
| Sinonimo | metal, silicone, defoamer s-10, flots 100sco, powder, dust, unii-z4152n8iui, polyeristalline powder, ccris 6599, ccris 6831 |
| Informazioni di solubilità | Insoluble in water. |
| Vedi altri risultati |
RUO – Research Use Only
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