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Tetramethylammonium hydroxide, 2.38% w/w aq. soln., Electronic Grade, 99.9999% (metals basis)
Descrizione
Tetramethylammonium hydroxide is used as anisotropic etching of silicon, as a basic solvent in the development of acidic photo resist in the photolithography process, and is highly effective in stripping photo resist, and is used as a surfactant in the synthesis of ferrofluid, to inhibit nanoparticle aggregation.
This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.
Specifica
Specifica
| Materiale o nome chimico | Tetramethylammonium hydroxide |
| Colore | Colorless to Yellow |
| Note percentuale saggio | (metals basis) |
| Formula lineare | (CH3)4NOH |
| Quantità | 250 mL |
| Numero UN | UN1835 |
| Beilstein | 3558708 |
| Sensibilità | Air Sensitive |
| Indice di Merck | 14,9224 |
| Informazioni di solubilità | Soluble in water. |
| Vedi altri risultati |
RUO – Research Use Only
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